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Chemical vapor deposition (CVD) is a film growth technique that make gaseous substance containing thin films react by means of a glow discharge. According to experimental requirements, Our company de...
Brief Introduction:
Chemical vapor deposition (CVD) is a film growth technique that make gaseous substance containing thin films react by means of a glow discharge. According to experimental requirements, Our company designed this equipment to meet the needs of various types of film study.
Technical Parameter
| Tube Furnace
|
Display | LED |
| Max. Temperature | 1200°C (for limiting) | |
| Continuous Woking Temp. | ≤1100℃ | |
| Heating Rate | Suggestion: 0~5℃/min
If use temp. Controller. |
|
| Temperature Zone | 200+200+200mm | |
| Heating Element | Fe-Cr-Al Alloy doped by Mo | |
| Thermocouple | N type | |
| Temperature Control Accuracy | ±1℃ | |
| Tube Size
|
OD 150 mm x (1000-1200mm) length | |
| Material: quartz tube | ||
| Temperature Controller
|
30 programmable segments for precise control of heating rate, cooling rate and dwell time.
Built-in over temperature alarm and protection allows for operation without an attendant. A N-type thermal couple is built in the furnace to control furnace temperature |
|
| Heating curves | 30 steps programmable | |
| Vacuum Flange | Stainless Steel vacuum flange with valve | |
| Power | 380V, 50 Hz, single phase at max. 10KW | |
| Vacuum Pump
|
Rotary Vane Vacuum Pump + diffusion pump | vacuum inside the tube is around 10-5 Torr.
The rotary vane vacuum pump and diffusion pump will be designed into a cart with wheel. |
| Digital Vacuum Gauge | 3.8x10-5 to 1125 Torr measurement range
Anti-corrosive, gas-type independent |
|
Note: Different Tube Sizes and temperature are available based on your requirement, pls contact us freely if there is any specific requirement.