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1100℃ Slide Chamber Tube Furnace
It adopts international advanced manufacturing technology, modelling is novel and reasonable structure; Has been all kinds of the validation sample experiments, and has been widely used in semiconduct...
Brief Introduction:
It adopts international advanced manufacturing technology, modelling is novel and reasonable structure; Has been all kinds of the validation sample experiments, and has been widely used in semiconductor device research and development and production, etc
The main features are as below:
- Operation Temperature: 1100℃
- Maximum energy efficiency is achieved by surrounding the chamber with thermal-efficient alumina fiber ceramic insulation.
- Heavy duty double layer structure with cooling fan. Lower temperature in outside case.
- Can be used for graphene-growing or CVD system for the experiment for the RTP requirement.
- PID automatic control via current limiting phase angle fired the resistor, e.g. SCR(Silicon Controlled Rectifier).
- Power control with 30 segments programmable.
- Vacuum, in reversibility or protective atmosphere.
Technical Parameter:
| Display | LED |
| Chamber | Split and rail |
| Max. Temperature | 1200℃ for limiting |
| Continuous Working Temp. | ≤1100℃ |
| Heating Rate | Suggestion 0~10℃/min(max. 20℃/min) |
| Temperature Zone | Single 440mm |
| Temperature Control Accuracy | ±1℃ |
| Tube Size | Φ80×1400mm |
| Heating Element | Fe-Cr-Al Alloy doped by Mo |
| Thermocouple | K Type |
| Max. Power | 3.0 KW |
| Working Voltage | AC 208V-240V single phase, 50 Hz (or according to your requirement) |
| Temperature Control | PID automatic control via SCR power control
R485 Communication Port |
| Heating curves | 30 steps programmable |
| Chamber material | Alumina Fiber |
Note: Different Tube Sizes and temperature are available based on your requirement, pls contact us freely if there is any specific requirement.
