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Compact Atmosphere Controlled RTP Furnace with 4" OD Quartz Tube up to 1000ºC
It is a compact rapid thermal processing tube furnace with a 100mm diameter processing quartz tube and vacuum flange. It is designed for annealing semiconductor wafers or solar cells. It is heated ...
Product Introduction
Brief Introduction:
It is a compact rapid thermal processing tube furnace with a 100mm diameter processing quartz tube and vacuum flange. It is designed for annealing semiconductor wafers or solar cells. It is heated by IR lamps with a max heating rate of 1100ºC/min. 30 segment precision temperature controller with +/-1ºC accuracy is built into the furnace to allow for heating, dwelling, and cooling at various steps.
The main features are as below:
- Great temperature uniformity.
- Over temperature protection and alarm.
- PID automatic control via SCR power control.
Technical Parameter:
| Display | LED |
| Structure | Split and Rail Chamber |
| Temperature | <1100℃ (1100 for limiting) |
| Max. Heating Rate | 1100℃/min |
| Suggest Heating Rate | ≤300℃/min |
| Temperature Zone | Single |
| Temperature Control Accuracy | ±1℃ |
| Hot zone length | 200mm |
| Tube Diameter | ID100 |
| Tube Material | Quartz Tube |
| Heating Element | IR Lamps |
| Sealing | Vacuum Flange |
| Thermocouple | N Type |
| Max. Power | 18 KW |
| Working Voltage | AC 380V Three phases, 50 Hz (or according to your requirement) |
| Temperature Control | PID automatic control via SCR power control |
| Heating curves | 30 steps programmable |
| Chamber material | Alumina Fiber |
| Warranty | One year limited warranty (Consumable parts such as heating elements are not covered by the warranty) |
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